Micro-scale contact behavior and its effect on the material removal process during chemical mechanical polishing - ScienceDirect
Micro-scale contact behavior and its effect on the material removal process during chemical mechanical polishing - ScienceDirect
Semiconductor Processing: Chemical Mechanical Planarization
Materials, Free Full-Text
PDF) Precipitation phenomena in an ultrafine-grained Al alloy
Emerging Challenges and Innovations in Surfactant-mediated Stabilization of Biologic Formulations - Journal of Pharmaceutical Sciences
Chemical Mechanical Planarization-Related to Contaminants: Their Sources and Characteristics
Machines, Free Full-Text
PDF) Effect of low copper content and heat treatment on intergranular corrosion of model AlMgSi alloys
Semiconductor Processing: Chemical Mechanical Planarization
An in situ study of chemical-mechanical polishing behaviours on sapphire (0001) via simulating the chemical product-removal process by AFM-tapping mod - Nanoscale (RSC Publishing) DOI:10.1039/C8NR04645J
Abrasive for Chemical Mechanical Polishing
The Mechanistic Determination of Doping Contrast from Fermi Level Pinned Surfaces in the Scanning Electron Microscope Using Energy-Filtered Imaging and Calculated Potential Distributions, Microscopy and Microanalysis
New Materials For Micro-Scale Sensors and Actuators An Engineering Review, PDF, Piezoelectricity
